Global Wafer Cleaning Equipment Market to exhibit 10% CAGR through 2027

December 21, 2020


As cited by the business intelligence report titled ‘Global Wafer Cleaning Equipment Market Size study, by Equipment Type (Single-wafer Spray System, Single Wafer Cryogenic System, Batch Immersion Cleaning System, Batch Spray Cleaning System, and Scrubbers), by Application (MEMS, CIS, Memory, RF Device, LED, Interposer, Logic), Technology (Wet Chemical, Vapor Dry Cleaning, Aqueous Cleaning, Cryogenic Aerosols Super-Critical Fluid Process) Operation Mode (Automatic, Semi-Automatic, Manual) and Regional Forecasts 2020-2027’, available with Market Study Report LLC, global wafer cleaning equipment market was worth USD 6.36 billion in the year 2019 and is slated to record a noteworthy CAGR of 10% during 2020-2027.
 

The research report states that rising adoption of the product for restoring performance levels of semiconductors, coupled with flourishing semiconductor as well as consumer electronics industry verticals are impelling the expansion of global wafer cleaning equipment market.
 

For the uninitiated, wafer cleaning equipment is primarily utilized for removing impurities and particles from the external surface of semiconductors without altering their quality.
 

Request sample copy of this Report: https://www.marketstudyreport.com/request-a-sample/2815932/
 

Industry experts claim that increasing penetration of smartphones as well as tablets, rapid development in microelectronics and nanotechnology, and escalating demand for LED lights for commercial applications are stimulating the global wafer cleaning equipment market outlook. Citing an instance, according to the ICA (Indian Cellular Association), in India, the annual production of smartphones increased from 3 million in 2014 to 11 million in the year 2017, accounting for around 11% of the total production across the globe.
 

However, changing quality standards for the product is a major restraining factor for the overall business development during the analysis timeframe.
 

Based on equipment type, global wafer cleaning equipment industry is fragmented into scrubbers, batch spray cleaning system, batch immersion cleaning system, single wafer cryogenic system, and single wafer spray system. With regards to operation mode, the overall market is split into manual, semi-automatic, and automatic. Speaking of technology terrain, the business sphere is bifurcated into cryogenic aerosols super-critical fluid process, aqueous cleaning, vapor dry cleaning, and wet chemical. The application spectrum of the market comprises of logic, interposer, LED, RF device, memory, CIS, and MEMS.
 

From a regional point of view, Asia-Pacific wafer cleaning equipment market is projected to exhibit the highest annual growth rate during 2020-2027. Rising investments by market players along with increasing disposable income are propelling the expansion of the regional market.
 

Leading players that influence the global wafer cleaning equipment industry trends are Falcon Process Systems Inc., Cleaning Technologies Group LLC, Akrion Systems LLC, Axus Technology LLC, Veeco Instruments Inc., Shibaura Mechatronics Corp., Lam Research Corporation, Applied Materials Inc., Tokyo Electron Limited (TEL), and SCREEN Holdings Co. Ltd. (formerly Dainippon Screen Mfg. Co. Ltd.) among others.

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