According to the research report titled ‘Global High-k and ALD/CVD metal precursors Market Size study, by Technology (Interconnect, Capacitors, Gates) and Regional Forecasts 2019-2026’, available with Market Study Report, global high-k & ALD/CVD metal precursors market was worth USD 528.99 million in 2018 and is expected to grow with a CAGR of 7.83% during 2019-2026.
 

For the record, high-k and ALD/CVD metal precursors are extensively used for scaling semiconductor products to 10 nm and above as well as in VLSI (Very-Large-Scale-Integration) technology. CVD (chemical vapor deposition) is idyllic for electrode, metal and copper deposition on semiconductor components using ALD (atomic layer deposition) procedures. The process plays a significant role while developing thin films in the semiconductor industry.
 

Escalating sales of consumer electronics and rising adoption of semiconductor devices are major factors driving the growth of global high-k and ALD/CVD metal precursors industry. According to World Semiconductor Trade Statistics, global semiconductor industry was worth USD 490 billion in 2019 and is expected to garner USD 506 billion by 2020. Rising R&D activities along with favorable government reforms which promote the expansion of semiconductor industry are also aiding the market size.
 

Considering the geographical landscape, Asia-Pacific market is expected to register substantial growth through 2026. Rapid expansion of the electronics industry along with extensive application of semiconductors in automotive and smartphone sectors are fueling the industry outlook in the region.
 

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Major contenders in worldwide high-k and ALD/CVD metal precursors market are Nanmat Technology Co. Ltd., TANAKA KIKINZOKU, Praxair Inc., JSR Corp., SAFC Hitech (Sigma-Aldrich Corp.), UP Chemical Co. Ltd., Adeka Corp., DowDuPont, Dynamic Network Factory, Merck Group and Air Products & Chemicals Inc. among others.