Chemical Vapor Deposition Market size is to reach US $47.2 Bn by 2026

July 12, 2019


Global chemical vapor deposition (CVD) market is anticipated to reach USD 47.2 billion by 2026, according to the latest research available at Market Study Report LLC, report provides extensively data on market share, growth, trends and forecasts for the period 2018-2026.
 

For the uninitiated, chemical vapor deposition is a vapor deposition technology utilized for placing thin films on diverse types of substrates. Advantages associated with CVDs comprise of conformal thickness, deposition through very high purity, and a higher deposition rate relative to the physical deposition methods.
 

As per the report, the growing semiconductor industry in tandem with the upsurge in components manufacturing for semiconductor devices is driving the chemical vapor deposition market share. Component miniaturization is the greatest need for today's microelectronics market, which can be successfully achieved via different chemical vapor deposition methods for crafting homogeneously thin films.
 

Rising production of solar modules and cells persuaded by the increasing number of solar power plants worldwide has also propelled chemical vapor deposition (CVD) market growth. CVD is used to prepare high-temperature materials like tungsten, ceramics, and others, for manufacturing solar cells, and high-temperature fiber composites. The CVD process is also applied across applications such as inorganic synthesis of materials, textile surface functionalization, coatings in numerous industrial applications, and to prepare chemicals for advanced ceramics.
 

In terms of CVD types, plasma-enhanced chemical vapor deposition (PECVD) and atomic layer chemical vapor deposition (ALCVD) have attained immense growth in the last few years, due to their effective characteristics and excellent outputs. ALCVD finds extensive use in achieving exceptionally conformal coatings, while plasma-enhanced CVD is used for extremely high deposition rates over metal surfaces. Some significant factors considered by the consumers while selecting the type of CVD methods include the volatility of precursor material, material cost, surface, rate of deposition for each process, and feasibility of each precursor at a specific temperature.
 

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Miniaturization is a steadily growing trend that has substantially led the microelectronics industry and is fueling product modernization in the chemical vapor deposition (CVD) market. The concept is quite profound due to high demand for modern electronics, right from embedded sensors to versatile consumer electronic products, where the size of the device matters. Such productions are made possible by technologies such as plasma-enhanced CVD and atomic layer CVD.
 

In terms of regional growth, Asia Pacific is the biggest contributor to the global CVD market owing to the high population and increasing consumption & production of consumer electronics.  The growing electronics industry of nations like Thailand, India, and Korea is slated to further drive chemical vapor deposition (CVD) market growth in this region.
 

The industry majors profiled in the global chemical vapor deposition (CVD) market report include Veeco Instruments Inc., Lam Research Corporation, Praxair Surface Technologies, Applied Materials, Inc., Adeka Corporation, Ulvac, Inc., Air Liquide, and Tokyo Electron Limited. Company profiles of these firms have been documented in the report under business overview, product benchmarking, financials, and recent developments.